Zhu Shifan,Xu Zhiheng,Chen Feida,Tao Haijun,Tang Xiaobin,Wang Yuqiao.Finite Element Simulation Insights into Electrodeposition Kinetics at the Interface of Planar Microelectrodes[J].The Journal of Physical Chemistry C,2023,127(2023):21363-21373.
时间:2023-01-10作者:来源:核技术与多学科交叉创新研究中心点击:213次
Zhu Shifan,Xu Zhiheng,Chen Feida,Tao Haijun,Tang Xiaobin,Wang Yuqiao.Finite Element Simulation Insights into Electrodeposition Kinetics at the Interface of Planar Microelectrodes[J].The Journal of Physical Chemistry C,2023,127(2023):21363-21373.
